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产品详情
简单介绍:
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详情介绍:
SPI Supplies Process Controller for Plasma Prep III, 110v:
The Plasma Prep III Process Controller is a module add-on that gives greater versatility to the Plasma Prep III asher/etcher system or the Plasma Prep III Plasma Cleaner. With this module, a user can now:
Control a gas flow rate to adjust the pressure in the Plasma Prep III.
Select two inputted gasses and mix them proportionally for use as the input gas to the PPIII system.
Run the Plasma Prep III for a desired time
The Plasma Prep III Process controller should be considered by those that are in need of:
Reproducible run times for R&D and production
Multiple gas sources
Variable mixing of two gases
Dimensions: Width 9.5"(241mm) x Heigth 7" (177mm) x Depth 10.5" (266.7mm)
Power Supply:110/220 Volts
The Plasma Prep III Process Controller is a module add-on that gives greater versatility to the Plasma Prep III asher/etcher system or the Plasma Prep III Plasma Cleaner. With this module, a user can now:
Control a gas flow rate to adjust the pressure in the Plasma Prep III.
Select two inputted gasses and mix them proportionally for use as the input gas to the PPIII system.
Run the Plasma Prep III for a desired time
The Plasma Prep III Process controller should be considered by those that are in need of:
Reproducible run times for R&D and production
Multiple gas sources
Variable mixing of two gases
Dimensions: Width 9.5"(241mm) x Heigth 7" (177mm) x Depth 10.5" (266.7mm)
Power Supply:110/220 Volts
The small module size fits neatly on the Plasma Prep III frame and easily connects to the system. Two gas inputs allow for control of the pressure and potential mixing of two gasses through high precision flow meters. A membrane pad allows for easy input of process time (seconds, minutes, hours), memory storage and recall, and interlock functions which enables the process controller to interface and run the Plasma Prep III. The controller enables the Plasma Prep III to run a cycle after which the system will turn off the RF power and isolate the specimen chamber. This allows for a reproducible cycle for multiple runs in experiment or production.