高取向生产的超薄单晶金箔,晶面间距:0.102nm/0.143nm/0.204nm,可用于校正检测TEM的分辨率、成像质量、放大倍率和高倍率下的稳定性,尤其适用于TEM样品阶梯上的高度调整。
Resolution, image quality, magnification and instrument stability in high performance TEMs can be checked by imaging the 0.204nm, 0.144nm and 0.104nm planar spacings in these specially prepared gold crystals. The tests are particularly recommended if height adjustments are made on the TEM specimen stage. The gold foil is mounted on a standard 3mm gold TEM grid.